Planning > Program

Monday, November 20, 2017
08:00
09:00
10:00
11:00
12:00
13:00
14:00
15:00
16:00
17:00
18:00
›8:30 (1h)
› Exhibition hall
›9:30 (15min)
› Turing's amphitheater
›9:45 (30min)
› Turing's amphitheater
›10:15 (30min)
Patterning challenges for ultimate CMOS scaling and beyond CMOS nanofabrication
Jean-François de Marneffe (IMEC, Leuveu - Belgium)
› Turing's amphitheater
›10:45 (15min)
› Turing's amphitheater
›11:00 (20min)
› Exhibition hall
›11:20 (15min)
›11:35 (15min)
› Turing's amphitheater
›11:50 (15min)
› Turing's amphitheater
›12:05 (1h55)
› Agora's restaurant
›14:00 (30min)
Nitride nanowire LEDs : from rigid to flexible devices
Maria Tchernycheva (C2N - CNRS/UPSud, Orsay)
› Turing's amphitheater
›14:30 (15min)
› Turing's amphitheater
›14:45 (30min)
Nanoscale surface engineering by photon-assisted nanoimprint technology
Angélique Luu-Dinh (CSEM, Nauchatel - Switzerland)
› Turing's amphitheater
›15:15 (15min)
› Turing's amphitheater
›15:30 (20min)
› Exhibition hall
›15:50 (15min)
› Turing's amphitheater
›16:05 (20min)
›16:25 (15min)
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