Journées Nationales sur les Technologies Emergentes en micronanofabrication 2017

Breakfast and registration

Exhibition hall

Conference opening

Turing's amphitheater

Atomic Layer Etching: a precision technique to enable tomorrow's technology

Turing's amphitheater

Stéphanie Baclet (Oxford Instruments, UK)

Patterning challenges for ultimate CMOS scaling and beyond CMOS nanofabrication

Turing's amphitheater

Jean-François de Marneffe (IMEC, Leuveu - Belgium)

Etching – Lithography – Nano-patterning

Turing's amphitheater

› Microstructuration of titanium for implantable components - Edouard Laudrel, Groupe de recherches sur l\'énergétique des milieux ionisés 10:45-11:00 (15min)

Coffee break

Exhibition hall

Flash poster session

Flash poster session 1/2

Integration of technologies

Turing's amphitheater

› Planar HfOx ReRAM in CMOS BEOL using nanodamascene process - Marina Labalette, Laboratoire des Nanotechnologies et Nanosystèmes 11:35-11:50 (15min)

Etching – Lithography – Nano-patterning

Turing's amphitheater

› MOSFET III-V: from Planar to Ultra-Thin-Body and to Gate-All-Around design - Matej Pastorek, Institut d'électronique, de microélectronique et de nanotechnologie 11:50-12:05 (15min)

Lunch

Agora's restaurant

Nitride nanowire LEDs : from rigid to flexible devices

Turing's amphitheater

Maria Tchernycheva (C2N - CNRS/UPSud, Orsay)

Synthesis of materials

Turing's amphitheater

› Selective sublimation of GaN for top-down fabrication of nanostructures - Damilano Benjamin, Centre de recherche sur l'hétéroepitaxie et ses applications 14:30-14:45 (15min)

Nanoscale surface engineering by photon-assisted nanoimprint technology

Turing's amphitheater

Angélique Luu-Dinh (CSEM, Nauchatel - Switzerland)

Etching – Lithography – Nano-patterning

Turing's amphitheater

› Environment-controlled sol-gel soft-NIL processing for optimized imprinting at sub-micron dimensions. - Thomas Bottein, Institut des Matériaux, de Microélectronique et des Nanosciences de Provence 15:15-15:30 (15min)

Coffee break

Exhibition hall

Etching – Lithography – Nano-patterning

Turing's amphitheater

› Fabrication of versatile calibration samples for 3D super-resolution optical imaging with <5nm Z resolution using greyscale e-beam lithography and Nano-Imprint replication - Alexandre LAUVERGNE, Laboratoire d'Analyse et d'Architecture des Systèmes [Toulouse] - Franck Carcenac, Laboratoire d'Analyse et d'Architecture des Systèmes [Toulouse] 15:50-16:05 (15min)

Exhibitor's session

Flash poster session

Flash poster session 2/2

Poster session / Lab. tour