› Microstructuration of titanium for implantable components - Edouard Laudrel, Groupe de recherches sur l\'énergétique des milieux ionisés
10:45-11:00 (15min)
› MOSFET III-V: from Planar to Ultra-Thin-Body and to Gate-All-Around design - Matej Pastorek, Institut d'électronique, de microélectronique et de nanotechnologie
11:50-12:05 (15min)
› Selective sublimation of GaN for top-down fabrication of nanostructures - Damilano Benjamin, Centre de recherche sur l'hétéroepitaxie et ses applications
14:30-14:45 (15min)
› Environment-controlled sol-gel soft-NIL processing for optimized imprinting at sub-micron dimensions. - Thomas Bottein, Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
15:15-15:30 (15min)
› Fabrication of versatile calibration samples for 3D super-resolution optical imaging with <5nm Z resolution using greyscale e-beam lithography and Nano-Imprint replication - Alexandre LAUVERGNE, Laboratoire d'Analyse et d'Architecture des Systèmes [Toulouse] - Franck Carcenac, Laboratoire d'Analyse et d'Architecture des Systèmes [Toulouse]
15:50-16:05 (15min)
› Gold nanorod aggregation in presence of thiolated oligonucleotides - Henryk Laszewski, Laboratoire de Biologie et de Pharmacologie Appliquée
09:00-09:15 (15min)
› Flexible long-range plasmon waveguides for single-mode optical interconnects applications - Laurent Markey, Laboratoire Interdisciplinaire Carnot de Bourgogne
09:15-09:30 (15min)
› Periodic nanostructures formed on mesoporous silicon surface using ultrashort pulse lasers - Nadjib SEMMAR, Groupe de recherches sur l'énergétique des milieux ionisés
10:20-10:35 (15min)
› How to build a Si NW-based transistor without nanoscale processing - Maxime Legallais, Laboratoire des matériaux et du génie physique [Grenoble], Laboratoire des technologies de la microélectronique
10:35-10:50 (15min)
› Folding Photonic Crystals: Semiconductors ORIGAMI - Jean-Louis Leclercq, Institut des nanotechnologies de Lyon - Site d'Ecully
11:35-11:50 (15min)
› NANO-PROBING STATION INCORPORATING MEMS PROBES FOR 1D DEVICE RF ON-WAFER CHARACTERIZATION - Khadim Daffé, Institut d'électronique, de microélectronique et de nanotechnologie
11:50-12:05 (15min)
› IN SITU XPS CHARACTERISATION OF THE FIRST GROWTH STEPS OF SICN:H THIN FILMS FROM TETRAMETHYLSILANE-AMONIA MICROWAVE PLASMAS - Christophe Cardinaud, Institut des matériaux Jean Rouxel
15:50-16:05 (15min)
› Contribution to the understanding of the first stages of metal surface nanostructuration based on He+ implantation: experiments and simulations - Anne-Lise THOMANN, Groupe de Recherches sur l'Energétique des Milieux Ionisés
16:05-16:20 (15min)
› SUBMILLIMETER MULTIJUNCTION SOLAR CELLS DESIGNED FOR VERY HIGH CONCENTRATION PHOTOVOLTAICS - Pierre Albert, Institut Interdisciplinaire d'Innovation Technologique, Laboratoire de l'Intégration du Matériau au Système
09:00-09:15 (15min)
› ZnO nanostructures for electronics : from transistors to nanogenerators - Guylaine POULIN-VITTRANT, GREMAN
09:15-09:30 (15min)
› Robotics assembly for Lab on Fiber new nanoprobes. - Jean-Yves Rauch, FEMTO-ST
09:30-09:45 (15min)
› AlAs/InAlAs superlattice as a sacrificial layer for the epitaxial lift-off of low band gap III-V heterostructures lattice-matched to InP - François Chancerel, Laboratoire Nanotechnologies Nanosystèmes (LN2)- CNRS UMI-3463, Institut des nanotechnologies de Lyon
11:05-11:20 (15min)
› Photolithography and transfer by reactive ion etching of high resolution features from an ecofriendly and water developpable chitosan resist - mathieu caillau, Institut des nanotechnologies de Lyon
11:20-11:35 (15min)
› Packaging of electronic devices using 3D printing technology - Gabrielle Aspar, Laboratoire dÉlectronique et des Technologies de lÍnformation
11:35-11:50 (15min)
Exhibition hall
