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Monday, November 20, 2017 › | |
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›9:45 (30min)
Atomic Layer Etching: a precision technique to enable tomorrow's technology
Stéphanie Baclet (Oxford Instruments, UK) › Turing's amphitheater
›10:15 (30min)
Patterning challenges for ultimate CMOS scaling and beyond CMOS nanofabrication
Jean-François de Marneffe (IMEC, Leuveu - Belgium) › Turing's amphitheater
›11:20 (15min)
›14:00 (30min)
› Turing's amphitheater
›14:45 (30min)
Nanoscale surface engineering by photon-assisted nanoimprint technology
Angélique Luu-Dinh (CSEM, Nauchatel - Switzerland) › Turing's amphitheater
›16:05 (20min)
›16:25 (15min)
›16:40 (2h)
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